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Indane Chemical Company

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Platinum Sputtering Target

Platinum Sputtering Target

Specifications

Application The Platinum Sputtering Target is use in semiconductor, physical vapour deposition, chemical vapour deposition and optical applications
Availability Any diameter and thickness
CAS 7440-06-4
Diameter 50 mm ± 1mm
Purity 99.99%
Diameter (mm) 50mm

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